tantalum oxide
英 [ˈtæntələm ˈɒksaɪd]
美 [ˈtæntələm ˈɑːksaɪd]
网络 氧化钽; 钽的氧化物; 五氧化二钽
双语例句
- A mineral consisting of tantalum oxide of iron and manganese that occurs with niobite or in coarse granite; an ore of tantalum.
一种由铁和锰的钽氧化物组成的矿物，与铌铁矿共生，亦见于粗糙的花岗岩中，是一种钽矿石。 - Optical Properties of Aluminium Lanthanum Strontium Tantalum Oxide Crystal
钽铝酸锶镧单晶的光学性能 - Conclusion No adverse effect of tantalum and its oxide on the exposed workers was found.
结论未发现钽对接触工人有不良影响。 - The Research Progress of High Dielectric Constant Tantalum Oxide Films as MOSFET-gate
五氧化二钽高K薄膜作为MOSFET绝缘栅研究 - The porous aluminum oxide and the barrier aluminum oxide as the cathode substrate respectively, the tantalum piece as the anode, used the direct current electrodeposition method in the bromine acetone solution, has prepared the high dielectric properties nano-composite oxide film for the first time.
本文首次采用电化学沉积方法，分别以多孔型氧化铝和壁垒型氧化铝基体作阴极，钽片作阳极，在溴的丙酮溶液中采用直流电沉积方法，制备了高介电性能纳米复合阳极氧化膜。 - The tantalum oxide coating material Chemical structure of HgCdTe-anodic oxide
五氧化二钽镀膜材料碲镉汞阳极氧化层的化学结构分析 - Properties of Composite Electrode of Tantalum Oxide and Molybdenum Nitride
氮化钼与五氧化二钽复合电极性能的研究 - The technology and properties of Tantalum Oxide coating material have been introduced.
介绍了五氧化二钽镀膜材料的制作工艺及材料和膜层性能。 - A Study of Tantalum Oxide Humidity Sensitive Thin Films
氧化钽感湿薄膜的研究 - I-V characteristics of high dielectric constant tantalum oxide films
五氧化二钽薄膜的I&V特性 - Tantalum oxide and tantalum nitride films with different composition, microstructure, physical and mechanical properties fabricated by unbalanced magnetron sputtering were investigated in this paper.
本论文采用非平衡磁控溅射技术制备出不同成分、结构、物理性能和力学性能的Ta-O和Ta-N薄膜。 - Kinetics of reduction of niobium oxide and tantalum oxide in fluorine-containing slag in blast furnace smelting
含氟高炉渣中氧化钽和氧化铌的还原动力学研究 - Tantalum oxide thin films were deposited by reactive DC magnetron Sputtering from a tantalum target in Ar-O2 mixture.
在Ar-O2混合气氛中采用直流磁控反应溅射沉积制得了氧化钽薄膜。 - Iridium-Tantalum Oxide Anode Coatings
铱钽氧化物阳极涂层的研究 - The Fabrication and Properties of Tantalum Oxide and Tantalum Nitride Films
Ta-O及Ta-N薄膜的制备及其性能研究 - The dielectric performance indicated that the tantalum anode dissolves deposit in the porous surface and the porous internal, bonds with the porous oxide film by a nanometer size.
电性能研究表明多孔型氧化铝作基体进行电沉积时，钽阳极溶解部分在多孔膜表面及多孔内部都有沉积，且以纳米尺寸与多孔氧化膜复合。 - Determination of impurity in high purity tantalum and its oxide by ICP-AES after trace-matrix separation
分离基体ICP-AES法测定高纯钽及其氧化物中杂质元素 - Besides the influence of crystal structure, the better stability of zirconium oxide and tantalum oxide can improve the chemical and thermal stability of ITO films.
除了晶体结构的影响之外，稳定性较好的氧化锆和氧化钽也提高了薄膜的化学稳定性和热稳定性。